Next Trade Shows
Photonics West,San Jose, Jan, 2008
American Physical Society, New Oreleans, March 2008
CLEO - San Jose, May 2008
Nanotech - Boston, June 2008
American Vacuum Society National Meeting, Boston, Oct 2008.
Materials Research Society - Boston, Nov, 2008
Contact Us for literature on any of these shows.
Latest Publications
A paper from the 2004 Fine Particle Society has finally cleared through A preprint is available, please email us for it
Applied Surface Technologies has recently written a paper for the 2000 McGraw-Hill Annual Review of Technology covering all forms of CO2 cleaning. A preprint is available, please email us for it
The 1999 Clean Tech had a panel discussion on CO2 cleaning methods and the magazine will print the major points, highlights and questions. Published Fall, 1999.
Proceedings of the 1997 Precision Cleaning Show. This paper, without the photographs, can be downloaded.
The Proceedings of the 1996 and 1998 Fine Particle Soiety, has finally been published in 1999. We have extra copies.
New Equipment
New Nozzles: We developed a few new nozzles with reduced consumption, flow and velcoity, yet they still perform organic thin film and particle removal. By still having oganic removal, submicron particle removal will occur. The polymer nozzle is still available if requested. These nozzles are available to existing customers at reduced prices
Clean Room Compatible Systems: We can supply the high purity K4 units, or retrofit these units, to standards that are cleanroom acceptable. The unit is solvent wiped and snow cleaned. Heat shrink tubing is placed over the flexible hose and sealed. This makes for easy wipe down within the cleanroom. The unit will be double bagged in Ar.
Dual Gas Units: We make a teflon insert that can fit over the nozzle and then nitrogen passes over and about the cold CO2 stream. This design is based upon the ideas of Hoenig, 1986. This does not eliminate the moisture problems, but reduces it. The Dual Gas Unit (K6-10DG) uses 2 solenoid valves, one for the CO2 and another for the nitrogen flow. We can supply as handheld or in a box for mounting on a process line. Solenoid controls can be footpetals or just 24VDC signals.
Process Environment Chambers: Applied Surface Technologies in conjuction with others offers laminar flow hoods for use as cleaning chambers. Email for information. One special unit hhas been made for cleaning fiber optic connectors. Email for information.
Automation: We offer automation abilities. In conjunction with others, we can supply custom automation units. These machines can meet the needs of thin film, wafers, optics, relays, and many other manufacturing processes. We offer many arrangements, including a 4 axis movement (x,y,z, rotation), Class 10 environment and many other features. Email for information.
Large Area Blaster - By using one of 3 tube diameters (range from 0.033 to 0.062) and a second expansion, this modified standard unit can remove residual particles from large areas quickly.
Methods and Applicatons
Sample preparartion for AFM is a growing area. See the AFM page for an example of removing 0.03 micron particles. CO2 Snow cleaning removes particle and organic residues and yields cleaner images and less tip artifacts. This is due to the removal of stray particles and "nanoscum". We think cleaning an AFM tip is possible, we did it once and want a manufacturer to assist.
One user tried a high purity SFC CO2 cylinder that had a He head space. The input pressure was at 1500 psi instead of the ususal 800 psi. They claim better cleaning over a larger area. A short working distance may give more liquid CO2 on the surface and greater particle and organic cleaning.
Cleaning parts for high vacuum and UHV have led some users to reduce solvent consumption and also yields cleaner srufaces for use in vacuum and also high voltage applications.
One user developed a simple and inexpensive way to clean wafers. Email for ideas.
